Electron beam microscope / Electron beam writer (Zeiss Supra 40)

The Supra 40 is our brand new field emission scanning electron microscope installed in dec. 2005. It is equipped with the latest version of the Gemini column which delivers high resolution even at low acceleration voltages (2.1nm at 1kV). At low acceleration voltages charging effects in non-conducting samples are strongly reduced, therefore gold coating is not necessary. The system is upgraded with a beam blanker and a pattern generator software (Raith Quantum), which makes it convertible into an electron beam writer.

The span of the motorized sample stage is large enough for 4" wafers. 6" wafers can also be loaded with restrictions in the stage movements. Holders are available for small specimens.

Technical information

Electron source Shottky field emitter
Acceleration voltage 100V-30kV
Beam current range 1pA - 10nA
Beam current stability 0.2%/h
Stage span x,y 130mm; z 50mm; R 360°; q -5...+70°
Chamber size 330x270mm
Specimen size up to 4", 6" with limited span
Sensors In-lens secondary electron detector
Everhart-Thornley secondary electron detector
Solid state four-quadrant back-scattered electron detector
Resolution: 1kV 2.1nm
  20kV 1.0nm
  30kV 0.8nm
Pattern generator Raith Quantum (2.5MHz)
Beam blanker Electrostatic (100kHz)


Supra40
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