The SUSS MJB 3 HP/350W Mask Aligner is designed for high resolution photolithography and offers flexibility in the handling of irregularly shaped substrates and pieces of differing thicknesses.

Technical information

Max. exposure area	ca. 3"
Photomask size	up to 4"
Resolution	0.6 µm
Exposure modes	hard contact, soft contact, vacuum contact
Light source	350W mercury short-arc lamp
Wavelength range	350-450nm (max. 436 nm)
Alignment accuracy	0.2 µm