The PLASMOS SD 2300 ellipsometer works using rotating analyzer method and can be used for measurement of film thickness and refractive index of optically transparent and absorbing layers.
Technical information| Light source | He-Ne laser, wavelength 632.8 nm |
| Time of measurement | under 1 s/point |
| Wafer size | up to 145 mm |
| Incidence angle range | 35 - 73 ° |
| Analyzed layer number | up to 5 |
| Thickness error for SiO2 film (fixed refractive index) |
< 0.6 nm |
