| Technical data | |
| Substrate size | <1", 1", 2", 3", 4" |
| Mask size | 4", 5", 6" |
| Thickness of substrate and mask | Max 10 mm |
| Alignment: range rotation accuracy option |
all movements controlled by step motors and piezos X-Y-Z +/- 5 mm +/- 3° standard - 1,25 µm high-resolution - 0,1 µm (with piezo-translators) |
| Alignment possibilities | First Print - Alignment OFF Separation -adjustable in 1 µm steps (5 - 99 µm) |
| Contact pressure between mask and substrate | Adjustable from 1 Newton |
| Exposure possibilities | Soft contact, Vacuum contact, Hard contact, Proximity and exposure without mask |
| Microscope Top side alignment Bottom side alignment Magnification |
Split field MS 251 Split field MS 250 10x |
| Lamp house | For wavelength of 350nm for power of 350W |
| Uniformity of illumination | +/- 3% with 4" |
