Rapid Thermal Annealing system Foton-6 is designed for samples with non-standard shape. The opening top cover allows the supporting pins to be position for wide range of sample sizes. Halogen lamps and reflectors can be easily removed for cleaning. This prevents cross-contamination of samples with different chemical composition (for example Si and GaAs samples)

Technical information

Technical data
Temperature range	400-1200°C
Temperature measurement method	thermocouple
Maximum heating ramp rate	1000°C/s
Cooling ramp rate	up to 200°C/s (depends on temperature range)
Maximum process time	15s
Maximum sample size	120x120mm
Process ambient	air, nitrogen, oxygen