RCA-bench (RCA-1, RCA-2, HF) in the furnace (Centrotherm) section
Acetone + IPA solvent clean/strip bench in lithography section
BHF etch in lithography section
"Piranha" for mask cleaning in litography section
RCA bench in Thermco section
TMAH, HF, Al (H3PO4) hoods in Wet process section
